- Home
- News Releases
- Back Issues
- November FY2022
- Two-Year Extension of the Collaborative Search Pilot Program Between the United States Patent and Trademark Office and the Japan Patent Office
Two-Year Extension of the Collaborative Search Pilot Program Between the United States Patent and Trademark Office and the Japan Patent Office
November 1, 2022
The US-JP Collaborative Search Pilot Program (hereinafter referred to as "US-JP CSP") commenced its first phase (two years) in August 2015. The third phase is currently being implemented and was scheduled to end on October 31, 2022. As a result of further discussion between the JPO and the USPTO, the two Offices agreed to extend the third phase of the two-year pilot program for another two years.
1. Background
The US-JP CSP is a joint effort between the USPTO and the JPO in which examiners of both Offices scrutinize patent applications filed with both Offices respectively to share search results along with their opinions and provide the initial examination results from both Offices to the applicants quickly and in the same time period.
* FA: Initial examination results (first action)
The US-JP CSP will promote international business development by allowing Japanese companies and other businesses to improve the predictability of the information on the timing of examinations and acquisition of patent rights for applicants, and be able to obtain stronger and more stable patent rights based on examination results from patent examiners in Japan and the US quickly and in the same time period.
2. Extension of the US-JP CSP
The first phase (two years) of the US-JP CSP commenced in August 2015, the second phase was implemented for three years starting from November 2017, and the third phase is currently being implemented. The third phase was scheduled to end on October 31, 2022.
As a result of discussion with the USPTO, the two Offices agreed to extend the third phase of the two-year pilot program for another two years, continuing until October 31, 2024.
With this agreement, Japanese companies and other businesses will be able to continue to use the US-JP CSP to obtain examination results in both Japan and the US quickly and in the same time period.
In order to decrease the burden on applicants, the JPO and the USPTO have been discussing the introduction of a single petition form that can be used for both Offices. With the use of the single petition form, applicants are required to apply to only one of the Offices for CSP, instead of applying to both Offices which is the current procedure. By extending the third phase and simplifying the petition process, we hope to encourage more users to take advantage of the US-JP CSP when acquiring patent rights in Japan and the US.
